Reactive Magnetron Sputtering of Nitrides and Oxides: Understanding the Process and Optimizing the Film Quality
Reactive Magnetron Sputtering of Nitrides and Oxides: Understanding the Process and Optimizing the Film Quality
Moeller, W.
Abstract
kein Abstract vorhanden
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Eingeladener Vortrag (Konferenzbeitrag)
Plasmas, Surfaces, and Thin Films, 11.06.2008, London, United Kingdom
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