Microstructure-property relations of reactively magnetron sputtered VCxNy films
Microstructure-property relations of reactively magnetron sputtered VCxNy films
Mitterer, C.; Fateh, N.; Munnik, F.
Abstract
VCxNy films with a wide range of chemical composition were grown onto silicon and high-speed steel substrates using reactive unbalanced magnetron sputtering from V targets in an Ar/N2/C2H2 atmosphere at a substrate temperature of 500°C. A solid solution of VN and VC is formed for N2 and C2H2 addition, with increasing fractions of an additional amorphous carbon phase for increasing C2H2 flow ratios. While an increase in hardness is observed for low carbon contents due to solid solution hardening, raising the amorphous carbon phase fraction results in a hardness reduction. Dry-sliding ball-on-disc tests yield low friction coefficients with values of 0.22 for those films with the highest content of amorphous carbon phase, while the lowest wear is observed for films with dominating vanadium carbonitride solid solution. The low friction behavior is attributed to the formation of tribo-layers with easy-shearable C-H bonds formed in humid atmospheres, and is not observed in dry nitrogen and synthetic air.
Keywords: Vanadium carbonitride; amorphous carbon; sputtered films; low friction
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 15140) publication
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Surface & Coatings Technology 205(2011), 3805-3809
DOI: 10.1016/j.surfcoat.2011.01.037
Cited 35 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-15140