Self-consistent isotopic comparative method used to determine dependence of secondary-yields on oxygen concentration in Si-O system up to 33%
Self-consistent isotopic comparative method used to determine dependence of secondary-yields on oxygen concentration in Si-O system up to 33%
Dupuy, J. C.; Prudon, G.; Dubois, C.; Kögler, R.; Akhmadaliev, S.; Perrat-Mabilon, A.
Abstract
Yields of B+,O+,Si+, B-, O-, and Si- versus oxygen concentration were determined in Si under Ar+ bombardment using the isotopic comparative method (ICM). Samples containing a near-uniform low concentration of 18O and a Gaussian-like profile of 16O with high concentration were fabricated by multi-energy ion implantation. ICM allows to determine the oxygen concentration profile by secondary-ion mass spectrometry. The ion yield can be measured as a function of the oxygen concentration up to 33 at%. Whatever the charge of the secondary ions, all relative ion yields are enhanced with increasing oxygen concentration. Very strong matrix effects due to oxygen are found for B+ (>100), whereas moderate or slight matrix effects are found for Si+ and O- (>10) and for Si-, B-, and O+ (<4). Relative ion yields of B+ and Si+ differ versus oxygen, whereas they are identical for B- and Si-. The relative ionization probability versus oxygen for Si+ agrees very well with the results of William´s group.
Keywords: SIMS; matrix effect; ion yield; silicon-oxygen system; ICM
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 17806) publication
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Surface and Interface Analysis 45(2013)1, 369-372
Online First (2012) DOI: 10.1002/sia.5108
Permalink: https://www.hzdr.de/publications/Publ-17806