Permanent magnet electron beam ion source/trap systems with bakeable magnets for improved operation conditions

EBIS/T systems provide ions of intermediate up to the highest ion charge states via electron impact ionization by a dense electron beam. In order to produce highly charged ions in an EBIS/T high electron beam densities of several hundred A/cm2 are necessary to realize high ionization factors and compensate for charge destructive processes such as charge exchange etc. The required electron beam compression is realized via an axial magnetic field. Two different EBIS/T magnet design approaches have been established over the past decades: Superconducting magnets with high magnetic fields of several Tesla (significant initial and maintenance costs), Compact permanent magnets with magnetic fields of Sub-Tesla (low initial and maintenance costs). Comparing both solutions shows that the produced ion species and current output of the permanent magnet EBIS/T suits most of the user requirements.