Subsecond Annealing of Advanced Materials: Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Subsecond Annealing of Advanced Materials: Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Skorupa, W.; Schmidt, H.; (Editors)
Abstract
The thermal processing of materials ranges from few femtoseconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.
Keywords: Activation of Dopants; Annealing by Swift Heavy Ions; Epitaxial Growth of Silicon; Explosive Crystallisation; Flash Lamp Annealing; Pulsed Laser Annealing; Radiation Thermometry; Sub-second Annealing; Thermal Processing of Materials; Thermal Spike-induced Nanostructuring
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 20059) publication
-
Buch (Herausgeberschaft)
Cham, Heidelberg, New York, Dordrecht, London: Springer International Publishing Switzerland, 2014
321 Seiten
ISBN: 978-3-319-03130-9
Permalink: https://www.hzdr.de/publications/Publ-20059