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Electronic transport in helium-ion-beam etched encapsulated graphene nanoribbons

Nanda, G.; Hlawacek, G.; Goswami, S.; Watanabe, K.; Taniguchi, T.; Alkemade, P. F. A.

Abstract

We report the etching and electronic transport in nanoribbons of graphene sandwiched between atomically flat hexagonal boron nitride (h-BN). The etching of ribbons of varying width was achieved with a focused beam of 30 keV He+ ions. Using in-situ electrical measurements, we established a critical dose of 7000 ions nm−2 for creating a 10 nm wide insulating barrier between a nanoribbon and the rest of the encapsulated graphene. Subsequently, we measured the transport properties of the ion-beam etched graphene nanoribbons. Conductance measurements at 4 K show an energy gap, that increases with decreasing ribbon width. The narrowest ribbons show a weak dependence of the conductance on the Fermi energy. Furthermore, we observed power-law scaling in the measured current-voltage (I-V) curves, indicating that the conductance in the helium-ion-beam etched encapsulated graphene nanoribbons is governed by Coulomb blockade.

Keywords: Helium Ion Microsope; Graphene; h-BN; Bandgap; Graphene Nanoribbons; Electronic Transport

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