Optoelectronic properties of ultra-doped Ge fabricated by ion implantation and flash lamp annealing


Optoelectronic properties of ultra-doped Ge fabricated by ion implantation and flash lamp annealing

Prucnal, S.; Berencén, Y.; Heera, V.; Voelskow, M.; Yuan, Y.; Wang, M.; Poddar, V.; Mazur, G. P.; Grzybowski, M.; Zgirski, M.; Sawicki, M.; Hübner, R.; Zhou, S.; Skorupa, W.

Abstract

Independent of the type of doping, it is challenging to achieve in semiconductors an effective carrier concentration much above 10^20 /cm3. On the other hand, the successful realization of defect free n-type and p-type ultra-doped Ge layers will enable a range of devices from sensors to quantum computers. In the case of conventional doping techniques (using equilibrium processing) the maximum carrier concentration is limited by the out-diffusion of dopants, a relatively low solid solubility limit, clustering and self-compensation processes. To overcome such limitations we have utilised strong nonequilibrium process consisting of an ion beam implantation to introduce dopants into Ge and rear-side millisecond range flash lamp annealing (FLA) for recrystallization of implanted layer and dopant activation. In contrast to conventional annealing procedures, rear-side FLA leads to full recrystallization of Ge and dopant activation independent of the pre-treatment. The maximum carrier concentration is well above 10^20 /cm3 for n-type and above 10^21 /cm3 for p-type dopants. The so-fabricated n-type Ge can be used in the field of mid-infrared plasmonics which has not been accessible by group-IV semiconductors. Single crystalline n-type Ge with carrier concentrations as high as 2.2×10^20 /cm3 displays a room-temperature plasma frequency above 1850 /cm1 (?=5.4 ?m), which is the highest value ever reported for n-type Ge. In the case of Ga implanted Ge the maximum effective carrier concentration measured at 3K is 1.1×10^21 /cm3 which is two times higher than the solid solubility limit of Ga in Ge. Our p-type Ge is defect and cluster free and shows the superconductivity at Tc = 0.95 K. These results base on the successful combination of ion beam implantation followed by the novel approach consisting of millisecond range rear-FLA. This work has been partially supported by the EU 7th Framework Programme "EAgLE" (REGPOT-CT-2013-316014).

Keywords: Ge; n-type; ion implantation; FLA

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