Flash Lamp Annealing: From Basics to Applications
Flash Lamp Annealing: From Basics to Applications
Rebohle, L.; Prucnal, S.; Reichel, D.
Abstract
The work gives a detailed introduction to the technology of flash lamp annealing, the corresponding physical background and an overview of the various applications of flash lamp annealing found in literature. It discusses a couple of issues which are relevant for process management with the focus on temperature measurement and temperature simulation. The application-related chapters include, inter alia, ultra-shallow junctions and hyperdoping in silicon, doping and superconductivity in germanium, silicon carbide, III-V semiconductors, diluted magnetic semiconductors, the crystallization of thin amorphous silicon films, semiconductor nanostructures, high-k materials, flash lamp annealing for monocrystalline, polycrystalline and thin film solar cells, transparent conducting oxides and flexible substrates.
Keywords: Thermal processing; semiconductors; flash lamp annealing; thin films; millisecond annealing
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 29200) publication
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Buch (Autorenschaft)
Cham: Springer, 2019
304 Seiten
DOI: 10.1007/978-3-030-23299-3
Permalink: https://www.hzdr.de/publications/Publ-29200