Helium ion microscopy and its application to low fluence materials modification
Helium ion microscopy and its application to low fluence materials modification
Abstract
Helium Ion Microscopy has become a standard imaging and nanofabrication technique in last decade. In my presentation I will introduce the technqiue and the underlying reasons for its exceptional capabilities. The latter include high lateral resolution, high depth of focus, ability to image insulating samples and exceptional nanofabrication capabilites. In the second part I will highlight selected applications of the method. This will include modification of 2D materials, magnetic materials and applications related to quantum technology. I will also allude on past and current developments in ion beam based analysis using the HIM.
[1] Hlawacek, G. & Gölzhäuser, A. (Eds.) Helium Ion Microscopy, Springer International Publishing, 2016.
[2] Hlawacek, G.; Veligura, V.; van Gastel, R. & Poelsema, B. Helium ion microscopy, J. Vac. Sci. Technol. B, 2014, 32, 020801
Keywords: HIM
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 32231) publication
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Vortrag (Konferenzbeitrag)
(Online Präsentation)
ŚRODOWISKOWE SEMINARIUM FIZYKI CIAŁA STAŁEGO, 04.11.2020, Krakau, Poland
Permalink: https://www.hzdr.de/publications/Publ-32231