Phase analysis in a-Fe after high-dose Si ion implantation by depth-selective conversion electron Mössbauer spectroscopy (DCEMS)
Phase analysis in a-Fe after high-dose Si ion implantation by depth-selective conversion electron Mössbauer spectroscopy (DCEMS)
Walterfang, M.; Kruijer, S.; Dobler, M.; Reuther, H.; Keune, W.
Abstract
Iron was implanted with 50 keV Si ions. The depth distribution of the formed Fe-Si phases was investigated by depth selective conversion electron Mossbauer spectroscopy.
Keywords: Ion implantation; iron silicides; Mossbauer spectroscopy
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Vortrag (Konferenzbeitrag)
Int. Conf. Applications Mössbauer Effect, Garmisch-Partenkirchen, 29.8.-3.9.1999
Permalink: https://www.hzdr.de/publications/Publ-3230