Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices
Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices
Variam, N.; Jeong, U.; Falk, S.; Mehta, S.; Posselt, M.; Feudel, T.; Horstmann, M.; Krüger, C.; Ng, C.-H.
Abstract
Informations can be requested. Email: M.Posselt@fz-rossendorf.de
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Vortrag (Konferenzbeitrag)
13th International Conference on Ion Implantation Technology, Alpbach, Austria, September 17-22, 2000 -
Beitrag zu fremdem Sammelwerk
Proc. 2000 Int. Conf. on Ion Implantation Technology, Alpbach, Austria, September 17 -22, eds.: H. Ryssel, L. Frey, J. Gyulai, H. Glawischnig, IEEE, Piscataway, USA, 2000, IEEE Publications 00EX432, p. 42
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