High Dose Nitrogen and Carbon Shallow Implantations in Silicon by PIII
High Dose Nitrogen and Carbon Shallow Implantations in Silicon by PIII
Ueda, M.; Reuther, H.; Guenzel, R.; Beloto, A. F.; Abramof, E.; Berni, L. A.
Abstract
Silicon was implanted with high doses of nitrogen and carbon Shallow by PIII.
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Vortrag (Konferenzbeitrag)
Conference on Ion Beam Modification of Materials 2000, Rio Grande do Sul, Brazil, 3.-8.Sept.2000
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