Si-nanocluster layers embedded in SiO2, Preparation by sputtering and annealing of SiO2/SiOX stacks- Electrical and optical characterization

Si-nanocluster layers embedded in SiO2, Preparation by sputtering and annealing of SiO2/SiOX stacks- Electrical and optical characterization

Schmidt, J. U.; Schmidt, B.

• Vortrag (Konferenzbeitrag)
  Internet Publikation: http://www.neop.de/

Permalink: https://www.hzdr.de/publications/Publ-5009