Nanopatterning of Si Surfaces by low-energy ion sputtering
Nanopatterning of Si Surfaces by low-energy ion sputtering
Gago, R.
Abstract
In this seminar the production of nanopatterning by ion beam sputtering (IBS) is presented, namely ripple and dot morphologies. The work is focused on the irradiation of Si surfaces but a general view of this research field is also discussed. Finally, the search of potential applications for these nanostructures is addresed.
Keywords: Ion sputtering; nanopatterning; ripples; nanodots
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Sonstiger Vortrag
05.05.2003 Forschungsseminar Micro- und Nano-Elektronik, Institut Für Materialwissenschaften Bergische Universität, Wuppertal (gez. Prof. Dr. Clivia SOTOMAYOR-TORRES)
Permalink: https://www.hzdr.de/publications/Publ-5457