Ni-Ti Surface Modification by Plasma Immersion Ion Implantation

The plasma immersion ion implantation (PIII) technique was used to modify and improve the surface of a Ni-Ti alloy (» 50.2 at.% Ni) for biomedical applications. The main goal has been the formation of a Ni-depleted surface, which should serve as a barrier to out-diffusion of Ni ions from the bulk material. Ion implantation of oxygen was carried out. The depth profiles of the elemental distribution in the alloy surface region, obtained by Auger electron spectroscopy (AES), confirm the formation of a Ti-rich oxide layer. The working plan also comprised ion implantation of nitrogen. In this case, the formation of titanium oxynitride (TiNxOy) was observed. The AES depth profiles clearly show a Ni-depleted fraction for experiments performed with 40 keV.