Doping of the Si nanowires
Doping of the Si nanowires
Ou, X.; Das Kanungo, P.; Koegler, R.
Abstract
review of doping of SiNW and the electrical characterization
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 14979) publication
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Eingeladener Vortrag (Konferenzbeitrag)
6th IUPAC International Symposium on Novel Materials and their Synthesis (NMS-VI), 11.-14.10.2010, Wuhan, China
Permalink: https://www.hzdr.de/publications/Publ-14979
