Structure and electrical properties of transparent conductive doped ZnO grown by reactive magnetron sputtering
Structure and electrical properties of transparent conductive doped ZnO grown by reactive magnetron sputtering
Cornelius, S.; Vinnichenko, M.; Munnik, F.; Heller, R.; Kolitsch, A.; Möller, W.
Abstract
No abstract available.
Keywords: Al-doped ZnO; transparent conductive oxide; zinc oxide; magnetron sputtering; doping; activation
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 16510) publication
-
Eingeladener Vortrag (Konferenzbeitrag)
IOP Workshop "Plasmas, Surfaces and Thin Films", 08.06.2011, London, England
Permalink: https://www.hzdr.de/publications/Publ-16510