Optimization of growth parameters of TiO2 thin films using a slow positron beam

Butterling, M.; Anwand, W.; Cornelius, S.; Potzger, K.; Smekhova, A.; Vinnichenko, M.; Wagner, A.

doi:10.1088/1742-6596/443/1/012073

Optimization of growth parameters of TiO2 thin films using a slow positron beam

Butterling, M.; Anwand, W.; Cornelius, S.; Potzger, K.; Smekhova, A.; Vinnichenko, M.; Wagner, A.

Abstract

TiO2 thin films grown on fused silica were investigated using positron Doppler broadening spectroscopy at the slow-positron-beam SPONSOR at the Helmholtz-Zentrum Dresden-Rossendorf.
Effects of changes in different parameters like temperature or oxygen flow during film deposition on positron sensitive parameters have been investigated and first results will be presented.

Keywords: Slow Positron; Doppler Broadening Spectroscopy; Thin Films

Beteiligte Forschungsanlagen

P-ELBE

Journal of Physics: Conference Series 443(2013), 012073
DOI: 10.1088/1742-6596/443/1/012073
Cited 2 times in Scopus
Poster
16th International Conference on Positron Annihilation (ICPA-16), 19.-24.08.2012, Bristol, Great Britain

Permalink: https://www.hzdr.de/publications/Publ-18332