Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf
1 PublikationIon beam synthesis of CoSi2 - microstructures by means of a high current focused ion beam
Bischoff, L.; Teichert, J.; Hesse, E.; Panknin, D.; Skorupa, W.
Abstract
The bfabrication of CoSi2 - structures by stoichiometric implantation of Co+ (E = 30...35 keV, Iion = 1.3nA) and Co++ ions (E = 60 keV, Iion = 0.6nA) at doses between 0.3 and 5x1017 cm-2 and a subsequent two step annealing (600°C, 60 min; 1000°C, 30 min in N2) is demonstrated. The dose dependence and the influence of the substrate temperature were studied. The quality of the silicide submicron structures was investigated by SEM, EDX and electrical measurements.
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Beitrag zu Proceedings
Proceedings of the Ninth International Conference on Ion Beam Modification of Materials Canberra, Australia, 5-10 February, 1995
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