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Quantitative molecular plating of large-area 242Pu Targets with improved layer properties

Vascon, A.; Runke, J.; Trautmann, N.; Cremer, B.; Eberhardt, K.; Düllmann, C. E.

Abstract

For measurements of the neutron-induced fission cross section of 242Pu, large-area (42 cm2) 242Pu targets were prepared on Ti-coated Si wafers by means of constant current density molecular plating. Radiochemical separations were performed prior to the platings. Quantitative deposition yields (495%) were determined for all targets by means of alpha-particle spectroscopy. Layer densities in the range of 100–150 μg/cm2 were obtained. The homogeneity of the targets was studied by radiographic imaging.
A comparative study between the quality of the layers produced on the Ti-coated Si wafers and the quality of layers grown on normal Ti foils was carried out by applying scanning electron microscopy and energy dispersive X-ray spectroscopy. Ti-coated Si wafers resulted clearly superior to Ti foils in the production of homogeneous 242Pu layers with minimum defectivity.

Keywords: 242Pu Large-area targets; Molecular plating; Quantitative deposition yield

Permalink: https://www.hzdr.de/publications/Publ-21049