Helium Ion Microscopy

In the past years Helium Ion Microscopy (HIM) [1] has become a mature imaging and nano-modification technique. The method is best known for its high resolution imaging capabilities. In addition it provides excellent charge compensation capabilities and high surface
sensitivity [2]. With the introduction of Ne as an working gas for the used gas field ion source (GFIS) also fast high resolution nanomachining has become possible. In the following I would like to give a brief introduction to the technique. Subsequently I want to highlight the
importance of channeling to achieve the best possible imaging conditions and maximize the surface sensitivity. Finally I want to present selected results on high and low fluence He and Ne milling and implantation.