High resolution surface patterning with the Helium Ion Microscope

In the past years Helium Ion Microscopy (HIM) [1] has become a mature imaging and nano-modification technique. The method is best known for its high resolution imaging capabilities. In addition it provides excellent charge compensation capabilities and a high surface sensitivity [2]. With the introduction of Ne as an working gas for the used Gas Field Ion Source (GFIS) also fast and high resolution nanomachining has become possible. In the following I would like to give a brief introduction of the technique. Subsequently, I will present examples of materials modification with a highly focused Helium or Neon beam.