Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf
1 PublikationSurface sealing using self-assembled monolayers and its effect on metal diffusion in porous low-k dielectrics studied using monoenergetic positron beams
Uedono, A.; Armini, S.; Zhang, Y.; Kakizaki, T.; Krause-Rehberg, R.; Anwand, W.; Wagner, A.
Abstract
Surface sealing effects on the diffusion of metal atoms in porous organosilicate glass (OSG) films were studied by monoenergetic positron beams. For a Cu(5 nm)/MnN(3 nm)/OSG(130 nm) sample fabricated with pore stuffing, C4F8 plasma etch, unstuffing, and a self-assembled monolayer (SAM) sealing process, it was found that pores with cubic pore side lengths of 1.1 and 3.1 nm coexisted in the OSG film. For the sample without the SAM sealing process, metal (Cu and Mn) atoms diffused from the top Cu/MnN layer into the OSG film and were trapped by the pores. As a result, almost all pore interiors were covered by those metals. For the sample damaged by an Ar/C4F8 plasma etch treatment before the SAM sealing process, self-assembled molecules diffused into the OSG film, and they were preferentially trapped by larger pores. The cubic pore side lengths in these pores containing self-assembled molecules was estimated to be 0.7 nm. Through this work, we have demonstrated that monoenergetic positron beams are a powerful tool for characterizing capped porous films and the trapping of atoms and molecules by pores.
Keywords: Positron annihilation low-k OSG SAM
Beteiligte Forschungsanlagen
- Strahlungsquelle ELBE DOI: 10.17815/jlsrf-2-58
- P-ELBE
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-2-58 is cited by this (Id 23235) publication
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Applied Surface Science 368(2016), 272-276
DOI: 10.1016/j.apsusc.2016.01.267
Cited 22 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-23235