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Ultra-fast thermal processing of TCO and other thin films

Rebohle, L.; Schumann, T.; Prucnal, S.; Skorupa, W.

Abstract

Thermal processing in the ms range comprises modern, non-equilibrium annealing techniques which allow various material modifications at the surface without affecting the bulk. Flash lamp annealing (FLA) is one of the most diverse methods of short time annealing with applications ranging from the classical field of semiconductor doping to the treatment of polymers and flexible substrates. The presentation focuses on the FLA of transparent conducting oxides.

Keywords: flash lamp annealing; thin film applications; transparent conducting oxide

Beteiligte Forschungsanlagen

Verknüpfte Publikationen

  • Eingeladener Vortrag (Konferenzbeitrag)
    6. Workshop Transparente leitfähige Materialien, 22.-23.11.2016, Erfurt, Deutschland

Permalink: https://www.hzdr.de/publications/Publ-24426