Precisely doping semiconductors by ion implantation
Precisely doping semiconductors by ion implantation
Abstract
Precisely doping semiconductors by ion implantation, an invited lecture at University of Warsaw
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 24698) publication
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Sonstiger Vortrag
Invited seminar at University of Warsaw, 22.09.2016, Warsaw, Poland
Permalink: https://www.hzdr.de/publications/Publ-24698
