Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf
1 PublikationThe effect of deposition processing on structural and luminescent properties of a-SiOC: H thin films fabricated by RF-magnetron sputtering
Vasin, A. V.; Rusavsky, A. V.; Kysil, D. V.; Prucnal, S.; Piryatinsky, Y.; Starik, S. P.; Nasieka, I.; Strelchuk, V. V.; Lysenko, V. S.; Nazarov, A. N.
Abstract
Amorphous silicon oxicarbide thin films (a-SiOC(:H)) were deposited by RF-magnetron sputtering using Si or SiC target in Ar/CH4/O2 flow. Interatomic bonding and light emission properties were analyzed by FTIR in transmission and attenuation total reflection (ATR) mode, Raman scattering and photoluminescence spectroscopy. Comparison of the results obtained by FTIR and ATR allows us to suggest that structural properties of the near-surface region and the bulk of the films are significantly different. The surface layer contains a significant fraction of polymer-like SiOC structural components in the form of Si-O-Si/Si-O-C chains and cages, while bulk of the film is represented by inorganic amorphous SiOx network with amorphous carbon precipitates. Samples with the high fraction of carbon precipitates exhibit white luminescence at room temperature. The origin of strong photoluminescence is discussed.
Keywords: Amorphous silicon oxicarbide thin films; ATR; FTIR; Photoluminescence
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 24853) publication
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Journal of Luminescence 191(2017), 102-106
Online First (2016) DOI: 10.1016/j.jlumin.2016.10.029
Cited 12 times in Scopus
Permalink: https://www.hzdr.de/publications/Publ-24853