Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

High current liquid metal ion sources are well known and found their first application as field emission electric propulsion (FEEP) thrusters in space technology. The aim of this work is the adaption of such kind of sources in broad ion beam technology.
Surface patterning based on self-organized nano-structures on e.g. semiconductor materials formed by heavy mono - or polyatomic ion irradiation from liquid metal (alloy) ion sources (LMAIS) is a very promising technique. LMAIS are nearly the only type of sources delivering polyatomic ions from about half of the periodic table elements. To overcome the lack of only very small treated areas by applying a focused ion beam (FIB) equipped with such sources, the technology taken from space propulsion systems was transferred into a large single-end ion implanter. The main component is an ion beam injector based on high current LMAIS combined with suited ion optics allocating ion currents in the µA range in a nearly parallel beam of a few mm in diameter. The mass selection of the needed ion species can be performed either by an ExB mass separator (Wien filter) and/or an existing dipole magnet of the ion implanter itself.
Different types of LMAIS (needle, porous emitter, capillary) are presented and characterized. The ion beam injector design is specified as well as the implementation of this module into a 200 kV high current ion implanter (Danfysik model 1090) operate at the HZDR Ion Beam Center (IBC). Finally, the obtained results of large area surface modification of Ge using polyatomic Bi2+ ions at room temperature from a GaBi capillary LMAIS will be presented and discussed.