Addendum: Ion beam irradiation of nanostructures: sputtering, dopant incorporation, and dynamic annealing
Addendum: Ion beam irradiation of nanostructures: sputtering, dopant incorporation, and dynamic annealing
Holland-Moritz, H.; Johannes, A.; Möller, W.; Ronning, C.
Abstract
A previously published formalism to derive nanosphere sputtering yields is corrected and refined.
Keywords: Ion Irradiation; Nanostructures; Sputtering
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Semiconductor Science and Technology 32(2017), 109401
DOI: 10.1088/1361-6641/aa88dc
Permalink: https://www.hzdr.de/publications/Publ-26660
