Determining antiferromagnetic domain patterns electrically
Determining antiferromagnetic domain patterns electrically
Kosub, T.; Hübner, R.; Appel, P.; Shields, B.; Maletinsky, P.; Kopte, M.; Schmidt, O. G.; Faßbender, J.; Makarov, D.
Abstract
Extrinsic effects on Cr2O3 thin films are shown. Also a statistical method to evaluate AF domain pattern in an electric way is demonstrated.
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 26672) publication
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Poster
AF Spintronics Workshop, 25.10.2017, Grenoble, France
Permalink: https://www.hzdr.de/publications/Publ-26672
