Nanopatterning of the (001) surface of crystalline Ge by ion irradiation at off-normal incidence: Experiment and simulation
Nanopatterning of the (001) surface of crystalline Ge by ion irradiation at off-normal incidence: Experiment and simulation
Erb, D.; de Schultz, R.; Ilinov, A.; Nordlund, K.; Bradley, M. R.; Facsko, S.
Abstract
Intricate topographical patterns can form on the surface of crystalline Ge(001) subject to low-energy ion irradiation in the reverse epitaxy regime, i.e., at elevated temperatures which enable dynamic recrystallization. We compare such nanoscale patterns produced by irradiation from varied polar and azimuthal ion incidence angles with corresponding calculated surface topographies. To this end, we propose a continuum equation including both anisotropic erosive and anisotropic diffusive effects. Molecular dynamics simulations provide the coefficients of angle-dependent sputter erosion for the calculations. By merely changing these coefficients accordingly, the experimentally observed surface morphologies can be reproduced, except for extreme ion incidence angles. Angle-dependent sputter erosion is thereby identified as a dominant mechanism in ion-induced pattern formation on crystalline surfaces under irradiation from off-normal incidence angles.
Keywords: Ion impact & scattering; Surface diffusion; Surface instabilities; Nanostructures; Vacuum interfaces; Molecular dynamics; Atomic force microscopy
Beteiligte Forschungsanlagen
- Ionenstrahlzentrum DOI: 10.17815/jlsrf-3-159
Verknüpfte Publikationen
- DOI: 10.17815/jlsrf-3-159 is cited by this (Id 31027) publication
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Physical Review B 102(2020), 165422
DOI: 10.1103/PhysRevB.102.165422
Cited 9 times in Scopus
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