Formation of the phases Ti3Al and TiAl by high dose implantation of Aluminium into Titanium
Formation of the phases Ti3Al and TiAl by high dose implantation of Aluminium into Titanium
Tsyganov, I. A.; Wieser, E.; Matz, W.; Mücklich, A.; Reuther, H.
Abstract
formation of buried intermetallic Ti-Al-phases by high doose Al implantation
Keywords: ion implantation; titanium; X-ray diffraction, TEM, AES
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Beitrag zu Proceedings
1st International Congress on Radiation Physics and Chemistry of Condensed Matter, High Current Electronics, and Modifikation of Materials with Particle Beams and Plasma Flows, Tomsk, Russia, Sept. 14 - 29, 2000
Permalink: https://www.hzdr.de/publications/Publ-3720