Microstructure and electrical properties of Ge and Si - implanted SiO2 layers

Microstructure and electrical properties of Ge and Si - implanted SiO2 layers

Gebel, T.

Abstract

no abstract delivered from author

Keywords: Nanocluster

Sonstiger Vortrag
Vortrag an der University of Catania, Italien (11. Oktober 2000)

Permalink: https://www.hzdr.de/publications/Publ-4869