Publikationsrepositorium - Helmholtz-Zentrum Dresden-Rossendorf

Multimodal impurity redistribution and nanocluster formation in Ge implanted silicon dioxide films

von Borany, J.; Grötzschel, R.; Heinig, K.-H.; Markwitz, A.; Matz, W.; Schmidt, B.; Skorupa, W.

• Applied Physics Letters 71 (22), 1 December 1997, p. 3215-3217
  DOI: 10.1063/1.120294
  Cited 99 times in Scopus

Permalink: https://www.hzdr.de/publications/Publ-916