AIM - Center for Application of Ion Beams in Materials Research

List of installations

All existing experimental facilities will be open for external users. However, it is expected that the interest will focus on

• 3 electrostatic MeV accelerators ( 5 MV tandem, 3 MV Tandetron, 2 MV van de Graaff)
• 7 beam lines for ion beam analysis (2x RBS, ERDA, external proton beam - PIXE, NRA, nuclear microprobe, high-resolution RBS with magnet spectrometer)
• three ion implanters (200 kV high current implanter, 500 kV implanter, LE broad beam implanter)
• 2 devices for plasma-based ion implantation (200-liter chamber, metal PBII)
• 2 devices for ion beam assisted deposition (IBAD)
• Fine-focused ion beam machine

LE-Implanter 2

500kV-Implanter

DIChamber 2

AIM Specialities:

Simultaneaous Double Implantation

Target Station Combining 3MV Tandetron and 500 kV Implanter

Ion Beam Analysis

ERDA at Nuclear Microprobe

Mikrosonde 1

ERDA-Schema

ERDA 1

Real-Time In-situ Analysis

Low-energy ion beam processing (< 2 keV) combined with in-situ heavy-ion ERDA
Real-time in-situ surface analysis and plasmadiagnostic during magnetron sputtering using ion beam analysis (NRA) and mass spectroscopy
Gaseous ion implantation (< 20 kV) combined with in-situ RBS and heavy-ion ERDA
High-energy implantation (from 3 MV Tandetron or 500 kV implanter) combined with in-situ high-resolution RBS
Ion beam assisted deposition combined with in-situ optical diagnostics (ellipsometry, infrared absorption) and in-situ film stress measurement

PIXE-Schema